CASC, Department of Materials, Imperial College London, London SW7 2AZ, UK.
ACS Nano. 2012 Apr 24;6(4):3614-23. doi: 10.1021/nn3008965. Epub 2012 Mar 29.
The synthesis of wafer-scale single crystal graphene remains a challenge toward the utilization of its intrinsic properties in electronics. Until now, the large-area chemical vapor deposition of graphene has yielded a polycrystalline material, where grain boundaries are detrimental to its electrical properties. Here, we study the physicochemical mechanisms underlying the nucleation and growth kinetics of graphene on copper, providing new insights necessary for the engineering synthesis of wafer-scale single crystals. Graphene arises from the crystallization of a supersaturated fraction of carbon-adatom species, and its nucleation density is the result of competition between the mobility of the carbon-adatom species and their desorption rate. As the energetics of these phenomena varies with temperature, the nucleation activation energies can span over a wide range (1-3 eV) leading to a rational prediction of the individual nuclei size and density distribution. The growth-limiting step was found to be the attachment of carbon-adatom species to the graphene edges, which was independent of the Cu crystalline orientation.
在电子学领域应用其固有特性之前,实现晶圆级单晶石墨烯的合成仍然是一个挑战。到目前为止,大面积化学气相沉积得到的石墨烯是多晶材料,晶界对其电学性能有不利影响。在此,我们研究了在铜基底上石墨烯成核和生长动力学的物理化学机制,为晶圆级单晶的工程合成提供了必要的新见解。石墨烯是由过饱和的碳原子吸附物种的结晶产生的,其形核密度是碳原子吸附物种的迁移率与其脱附率竞争的结果。由于这些现象的能量随温度而变化,形核激活能可以跨越很宽的范围(1-3eV),从而可以合理地预测单个核的大小和密度分布。研究发现,生长的限制步骤是碳原子吸附物种附着到石墨烯边缘,这与 Cu 晶体取向无关。