Department of Mechanical Engineering and the Materials Science and Engineering Program, The University of Texas at Austin, Austin, TX 78712, USA.
Science. 2013 Nov 8;342(6159):720-3. doi: 10.1126/science.1243879. Epub 2013 Oct 24.
The growth of high-quality single crystals of graphene by chemical vapor deposition on copper (Cu) has not always achieved control over domain size and morphology, and the results vary from lab to lab under presumably similar growth conditions. We discovered that oxygen (O) on the Cu surface substantially decreased the graphene nucleation density by passivating Cu surface active sites. Control of surface O enabled repeatable growth of centimeter-scale single-crystal graphene domains. Oxygen also accelerated graphene domain growth and shifted the growth kinetics from edge-attachment-limited to diffusion-limited. Correspondingly, the compact graphene domain shapes became dendritic. The electrical quality of the graphene films was equivalent to that of mechanically exfoliated graphene, in spite of being grown in the presence of O.
通过化学气相沉积在铜(Cu)上生长高质量的石墨烯单晶,并不总能实现对畴大小和形态的控制,并且在假定相似的生长条件下,不同实验室的结果也各不相同。我们发现 Cu 表面上的氧(O)通过钝化 Cu 表面活性位,大大降低了石墨烯成核密度。对表面 O 的控制实现了厘米级单晶石墨烯畴的可重复生长。氧还加速了石墨烯畴的生长,并将生长动力学从边缘连接限制转变为扩散限制。相应地,紧凑的石墨烯畴形状变成了树枝状。尽管在 O 的存在下生长,但石墨烯薄膜的电学质量与机械剥离的石墨烯相当。