Department of Electrical and Computer Engineering, University of Illinois at Urbana-Champaign, Urbana, IL 61801, USA.
Nanotechnology. 2012 May 4;23(17):175303. doi: 10.1088/0957-4484/23/17/175303. Epub 2012 Apr 5.
We report fabrication and use of a flexible array of nano-apertures for photolithography on curved surfaces. The batch-fabricated apertures are formed of metal-coated silicone tips. The apertures are formed at the end of the silicone tips by either electrochemical etching of the metal or plasma etching of a protective mask followed by wet chemical etching. The apertures are as small as 250 nm on substrates larger than several millimeters. We demonstrate how the nano-aperture array can be used for nano-fabrication on flat and curved substrates, and show the subsequent fabrication steps to form large arrays of sub-micron aluminum dots or vertical silicon wires.
我们报告了一种用于曲面光刻的纳米孔阵列的制造和应用。批量制造的孔由金属涂层硅尖端形成。通过电化学蚀刻金属或等离子体蚀刻保护掩模，然后进行湿法化学蚀刻，在大于几毫米的基底上形成 250nm 以下的小孔。我们展示了如何在平面和曲面上使用纳米孔阵列进行纳米制造，并展示了后续的制造步骤，以形成大阵列的亚微米铝点或垂直硅线。
