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在ITO、Au和n-Si上制备的Alq3薄膜的表面电位起伏

Surface-potential undulation of Alq3 thin films prepared on ITO, Au, and n-Si.

作者信息

Ozasa Kazunari, Ito Hiromi, Maeda Mizuo, Hara Masahiko

机构信息

RIKEN Advanced Science Institute, 2-1 Hirosawa, Wako, Saitama 351-0198, Japan.

出版信息

J Nanosci Nanotechnol. 2012 Jan;12(1):499-502. doi: 10.1166/jnn.2012.5413.

DOI:10.1166/jnn.2012.5413
PMID:22524009
Abstract

The surface potential (SP) morphology on thin films of tris(8-hydroxyquinolinato) aluminum (Alq3) was investigated with Kelvin probe force microscopy. Thin Alq3 films of 100 nm were prepared on ITO/glass substrates, Au/mica substrates, and n-Si substrates. Cloud-like morphologies of the SP undulation with 200-400 nm in lateral size were observed for all three types of the substrates. New larger peaks were observed in the cloud-like morphologies when the surfaces were exposed shortly to a light, while the SP average was reduced monotonically. The nonuniform distribution of charged traps and mobility was deduced from the SP undulation morphology and its photoexposure dependences.

摘要

采用开尔文探针力显微镜研究了三(8-羟基喹啉)铝(Alq3)薄膜的表面电势(SP)形态。在ITO/玻璃基板、金/云母基板和n型硅基板上制备了100nm的Alq3薄膜。在所有三种类型的基板上均观察到横向尺寸为200-400nm的SP起伏的云状形态。当表面短暂暴露于光下时,在云状形态中观察到新的较大峰值,而SP平均值单调降低。从SP起伏形态及其光暴露依赖性推断出带电陷阱和迁移率的不均匀分布。

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