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用于选择性无基质激光解吸/电离质谱的纳米结构化硅表面修饰。

Nanostructured silicon surface modifications for as a selective matrix-free laser desorption/ionization mass spectrometry.

机构信息

Department of Mechanical Engineering, National Central University, Jhongli, Taiwan.

出版信息

Analyst. 2012 Jun 7;137(11):2643-50. doi: 10.1039/c2an35189g. Epub 2012 Apr 25.

Abstract

Matrix-assisted laser desorption/ionization mass spectrometry is an established soft ionization method that is widely applied to analyze biomolecules. The UV-absorbing organic matrix is essential for biomolecule ionization; however, it also creates matrix background interference, which results in problematic analyses of biomolecules of less than 700 Da. Therefore, this study investigates hydrophilic, hydrophobic cationic, anionic and immobilized metal ion surface chemical modifications to advance nanostructured silicon mass spectrometry performance (nSi-MS). This investigation provides information required for a possible novel mass spectroscopy that combines surface-enhanced and nanostructured silicon surface-assisted laser desorption/ionization mass spectrometry for the selective detection of specific compounds of a mixture.

摘要

基质辅助激光解吸电离质谱是一种成熟的软电离方法,广泛应用于生物分子分析。紫外吸收有机基质对生物分子的电离至关重要;然而,它也会产生基质背景干扰,从而导致对小于 700 Da 的生物分子的分析出现问题。因此,本研究探索了亲水性、疏水性阳离子、阴离子和固定化金属离子表面化学修饰,以提高纳米结构化硅质谱性能(nSi-MS)。该研究为一种可能的新型质谱提供了信息,该质谱将表面增强和纳米结构化硅表面辅助激光解吸/电离质谱相结合,用于混合物中特定化合物的选择性检测。

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