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嵌入氧化锌薄膜中的纳米晶硅量子点的光学性质和子带隙形成

Optical properties and sub-bandgap formation of nano-crystalline Si quantum dots embedded ZnO thin film.

作者信息

Kuo Kuang-Yang, Hsu Shu-Wei, Huang Pin-Ruei, Chuang Wen-Ling, Liu Chuan-Cheng, Lee Po-Tsung

机构信息

Department of Photonics & Institute of Electro-Optical Engineering, National Chiao Tung University, Hsinchu, Taiwan.

出版信息

Opt Express. 2012 May 7;20(10):10470-5. doi: 10.1364/OE.20.010470.

Abstract

In this study, we fabricate ZnO thin films with nano-crystalline Si (nc-Si) quantum dots (QDs) using a ZnO/Si multilayer deposition structure and a post-annealing process, and the formation of high crystallinity of Si QDs embedded in the crystalline ZnO matrix is demonstrated. For optical properties, the essential features of ZnO material, high transmission in long-wavelength and high absorption in short-wavelength ranges, are preserved. We observe significantly enhanced light absorption and an unusual photoluminescence emission peak contributed from the nc-Si QDs in the middle-wavelength range. In addition, we confirm the formation of optical sub-bandgap and the obtained value is quite close to the unusual PL emission peak. We show that meaningful sub-bandgap can form in ZnO thin film by embedding nc-Si QDs while maintaining the advantageous properties of ZnO matrix. This newly developed composite material, nc-Si QD embedded ZnO thin films, can be useful for various electro-optical applications.

摘要

在本研究中,我们采用ZnO/Si多层沉积结构和后退火工艺制备了含有纳米晶硅(nc-Si)量子点(QDs)的ZnO薄膜,并证明了嵌入结晶ZnO基体中的Si量子点形成了高结晶度。对于光学性质,ZnO材料的基本特征得以保留,即在长波长范围内具有高透射率,在短波长范围内具有高吸收率。我们观察到光吸收显著增强,并且在中波长范围内出现了由nc-Si量子点贡献的异常光致发光发射峰。此外,我们证实了光学子带隙的形成,且所获得的值与异常的PL发射峰相当接近。我们表明,通过嵌入nc-Si量子点,在保持ZnO基体有利性质的同时,ZnO薄膜中可以形成有意义的子带隙。这种新开发的复合材料,即nc-Si量子点嵌入的ZnO薄膜,可用于各种电光应用。

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