Imec vzw, Kapeldreef 75, B-3001 Leuven, Belgium.
Ultrason Sonochem. 2013 Jan;20(1):69-76. doi: 10.1016/j.ultsonch.2012.04.015. Epub 2012 May 14.
Megasonic cleaning as applied in leading edge semiconductor device manufacturing strongly relies on the phenomenon of acoustic cavitation. As the occurrence of acoustic cavitation is incorporating a multitude of interdependent effects, the amount of cavitation activity in the cleaning liquid strongly depends on the sonication conditions. It is shown that cavitation activity as measured by means of ultraharmonic cavitation noise can be significantly enhanced when pulsed sonication is applied to a gas supersaturated liquid under traveling wave conditions. It is demonstrated that this enhancement coincides with a dramatic increase in particle removal and is therefore of great interest for megasonic cleaning applications. It is demonstrated that the optimal pulse parameters are determined by the dissolution time of the active bubbles, whereas the amount of cavitation activity depends on the ratio between pulse-off and pulse-on time as well as the applied acoustic power. The optimal pulse-off time is independent of the corresponding pulse-on time but increases significantly with increasing gas concentration. We show that on the other hand, supersaturation is needed to enable acoustic cavitation at aforementioned conditions, but has to be kept below values, for which active bubbles cannot dissolve anymore and are therefore lost during subsequent pulses. For the applicable range of gas contents between 100% and 130% saturation, the optimal pulse-off time reaches values between 150 and 340 ms, respectively. Full particle removal of 78 nm-diameter silica particles at a power density of 0.67 W/cm(2) is obtained for the optimal pulse-off times. The optimal pulse-off time values are derived from the dissolution time of bubbles with a radius of 3.3 μm and verified experimentally. The bubble radius used in the calculations corresponds to the linear resonance size in a 928 kHz sound field, which demonstrates that the recycling of active bubbles is the main enhancement mechanism. The optimal choice of the pulsing conditions however is constrained by the trade-off between the effective sonication time and the desire to have a sufficient amount of active bubbles at lower powers, which might be necessary if very delicate structures have to be cleaned.
兆声清洗在先进半导体器件制造中得到了广泛应用,其强烈依赖于声空化现象。由于声空化的发生涉及到许多相互依赖的效应,清洗液中的空化活性强烈依赖于超声处理条件。研究表明,在行波条件下,将脉冲超声应用于过饱和气体液体时,通过超谐波空化噪声测量的空化活性可以显著增强。实验证明,这种增强与颗粒去除率的显著提高相对应,因此对兆声清洗应用具有重要意义。实验证明,最佳脉冲参数由活性气泡的溶解时间决定,而空化活性的大小取决于脉冲关闭时间与脉冲开启时间的比值以及施加的声功率。最佳脉冲关闭时间独立于相应的脉冲开启时间,但随着气体浓度的增加而显著增加。我们表明,另一方面,需要过饱和度才能在上述条件下实现声空化,但过饱和度必须保持在低于活性气泡无法再溶解并在随后的脉冲中损失的水平。对于在 100%和 130%饱和度之间的气体含量应用范围,最佳脉冲关闭时间分别达到 150 至 340 毫秒。在 0.67 W/cm(2)的功率密度下,实现了 78nm 直径二氧化硅颗粒的完全去除。最佳脉冲关闭时间值是从半径为 3.3μm 的气泡的溶解时间推导出来的,并通过实验验证。在计算中使用的气泡半径对应于 928kHz 声场中的线性共振尺寸,这表明活性气泡的再循环是主要的增强机制。然而,由于有效超声时间和在较低功率下需要足够数量的活性气泡之间的权衡,脉冲条件的最佳选择受到限制,如果必须清洗非常精细的结构,则可能需要较低的功率。