Hirata Kei, Ishida Yoichi, Akashi Tetsuya, Shindo Daisuke, Tonomura Akira
TDK Corporation, Saku, Nagano, Japan.
J Electron Microsc (Tokyo). 2012;61(5):305-8. doi: 10.1093/jmicro/dfs051. Epub 2012 Jun 26.
The magnetic domain structure of the writer poles of perpendicular magnetic recording heads was studied using electron holography. Although the domain structure of a 100-nm-thick writer pole could be observed with a 300 kV transmission electron microscope, that of the 250-nm-thick writer pole could not be analyzed due to the limited transmission capability of the instrument. On the other hand, the detailed domain structure of the 250-nm-thick writer pole was successfully analyzed by a 1 MV electron microscope using its high transmission capability. The thickness and material dependency of the domain structure of a writer pole were discussed.
利用电子全息术研究了垂直磁记录头写入极的磁畴结构。尽管使用300 kV透射电子显微镜可以观察到100 nm厚写入极的磁畴结构，但由于该仪器的透射能力有限，无法分析250 nm厚写入极的磁畴结构。另一方面，利用1 MV电子显微镜的高透射能力成功分析了250 nm厚写入极的详细磁畴结构。讨论了写入极磁畴结构的厚度和材料依赖性。
