DND-CAT, Northwestern Synchrotron Research Center at the Advanced Photon Source, Argonne, IL 60439, USA.
J Phys Condens Matter. 2012 Aug 1;24(30):306002. doi: 10.1088/0953-8984/24/30/306002. Epub 2012 Jul 4.
We report a comprehensive study of the defects in room-temperature ferromagnetic (RTFM) Cu-doped ZnO thin films using x-ray absorption spectroscopy. The films are doped with 2 at.% Cu, and are prepared by reactive magnetron sputtering (RMS) and pulsed laser deposition (PLD), respectively. The results reveal unambiguously that atomic point defects exist in these RTFM thin films. The valence states of the Cu ions in both films are 2(+). In the film prepared by PLD, the oxygen vacancies (V(O)) form around both Zn ions and Cu ions in the hexagonal wurtzite structure. Upon annealing of the film in O(2), the V(O) population reduces and so does the RTFM. In the film prepared by RMS, the V(O)s around Cu ions are not detected, and the V(O) population around Zn ions is also smaller than in the PLD-prepared film. However, zinc vacancies (V(Zn)) are evidenced. Given the low doping level of spin-carrying Cu ions, these results provide strong support for defect-mediated ferromagnetism in Cu-doped ZnO thin films.
我们使用 X 射线吸收光谱对室温铁磁(RTFM)Cu 掺杂 ZnO 薄膜中的缺陷进行了全面研究。这些薄膜掺杂了 2at.%的 Cu,分别通过反应磁控溅射(RMS)和脉冲激光沉积(PLD)制备。结果明确表明,这些 RTFM 薄膜中存在原子点缺陷。两种薄膜中 Cu 离子的价态均为 2(+)。在通过 PLD 制备的薄膜中,氧空位(V(O))在六方纤锌矿结构中的 Zn 离子和 Cu 离子周围形成。在 O2 中对薄膜退火时,V(O)的数量减少,RTFM 也减少。在通过 RMS 制备的薄膜中,未检测到 Cu 离子周围的 V(O),并且 Zn 离子周围的 V(O)数量也小于通过 PLD 制备的薄膜。但是,锌空位(V(Zn))得到了证实。考虑到自旋载体 Cu 离子的低掺杂水平,这些结果为 Cu 掺杂 ZnO 薄膜中的缺陷介导的铁磁性提供了有力支持。