使用硅漂移探测器测量 WDS 精度和准确度的 X 射线强度的 EDS 测量。

EDS measurements of X-ray intensity at WDS precision and accuracy using a silicon drift detector.

机构信息

Material Measurement Laboratory, National Institute of Standards and Technology, Gaithersburg, MD 20899-8372, USA.

出版信息

Microsc Microanal. 2012 Aug;18(4):892-904. doi: 10.1017/S1431927612001109.

DOI:10.1017/S1431927612001109

Abstract

The accuracy and precision of X-ray intensity measurements with a silicon drift detector (SDD) are compared with the same measurements performed on a wavelength dispersive spectrometer (WDS) for a variety of elements in a variety of materials. In cases of major (>0.10 mass fraction) and minor (>0.01 mass fraction) elements, the SDD is demonstrated to perform as well or better than the WDS. This is demonstrated both for simple cases in which the spectral peaks do not interfere (SRM-481, SRM-482, and SRM-479a), and for more difficult cases in which the spectral peaks have significant interferences (the Ba L/Ti K lines in a series of Ba/Ti glasses and minerals). We demonstrate that even in the case of significant interference high count SDD spectra are capable of accurately measuring Ti in glasses with Ba:Ti mass fraction ratios from 2.7:1 to 23.8:1. The results suggest that for many measurements wavelength spectrometry can be replaced with an SDD with improved accuracy and precision.

摘要

硅漂移探测器（SDD）的 X 射线强度测量的准确性和精密度与波长色散光谱仪（WDS）对各种材料中各种元素的相同测量进行了比较。在主要（>0.10 质量分数）和次要（>0.01 质量分数）元素的情况下，证明 SDD 的性能与 WDS 一样好或更好。这既适用于光谱峰不干扰的简单情况（SRM-481、SRM-482 和 SRM-479a），也适用于光谱峰存在明显干扰的更困难情况（一系列钡/钛玻璃和矿物中的钡 L/钛 K 线）。我们证明，即使在存在明显干扰的情况下，高计数 SDD 光谱也能够准确测量钡：钛质量分数比为 2.7:1 至 23.8:1 的玻璃中的钛。结果表明，对于许多测量，波长光谱法可以用准确性和精密度得到提高的 SDD 来代替。