Newbury Dale E, Ritchie Nicholas W M
Materials Measurement Science Division, National Institutes of Standards and Technology,Gaithersburg,MD 20899,USA.
Microsc Microanal. 2016 Jun;22(3):520-35. doi: 10.1017/S1431927616000738.
Electron-excited X-ray microanalysis performed with scanning electron microscopy and energy-dispersive spectrometry (EDS) has been used to measure trace elemental constituents of complex multielement materials, where "trace" refers to constituents present at concentrations below 0.01 (mass fraction). High count spectra measured with silicon drift detector EDS were quantified using the standards/matrix correction protocol embedded in the NIST DTSA-II software engine. Robust quantitative analytical results for trace constituents were obtained from concentrations as low as 0.000500 (mass fraction), even in the presence of significant peak interferences from minor (concentration 0.01≤C≤0.1) and major (C>0.1) constituents. Limits of detection as low as 0.000200 were achieved in the absence of peak interference.
利用扫描电子显微镜和能量色散光谱法（EDS）进行的电子激发X射线微分析已被用于测量复杂多元素材料中的痕量元素成分，其中“痕量”是指浓度低于0.01（质量分数）的成分。使用硅漂移探测器EDS测量的高计数光谱，采用NIST DTSA-II软件引擎中嵌入的标准/基体校正协议进行定量分析。即使存在来自次要成分（浓度0.01≤C≤0.1）和主要成分（C>0.1）的显著峰干扰，痕量成分的稳健定量分析结果也能从低至0.000500（质量分数）的浓度中获得。在不存在峰干扰的情况下，检测限低至0.000200。
