School of Engineering, University of Glasgow, Glasgow, UK.
IEEE Trans Ultrason Ferroelectr Freq Control. 2012 Aug;59(8):1820-9. doi: 10.1109/TUFFC.2012.2387.
High-frequency ultrasound is needed for medical imaging with high spatial resolution. A key issue in the development of ultrasound imaging arrays to operate at high frequencies (≥30 MHz) is the need for photolithographic patterning of array electrodes. To achieve this directly on 1-3 piezocomposite, the material requires not only planar, parallel, and smooth surfaces, but also an epoxy composite filler that is resistant to chemicals, heat, and vacuum. This paper reports, first, on the surface finishing of 1-3 piezocomposite materials by lapping and polishing. Excellent surface flatness has been obtained, with an average surface roughness of materials as low as 3 nm and step heights between ceramic/polymer of ∼80 nm. Subsequently, high-frequency array elements were patterned directly on top of these surfaces using a photolithography process. A 30-MHz linear array electrode pattern with 50-μm element pitch has been patterned on the lapped and polished surface of a high-frequency 1-3 piezocomposite. Excellent electrode edge definition and electrical contact to the composite were obtained. The composite has been lapped to a final thickness of ∼55 μm. Good adhesion of electrodes on the piezocomposite has been achieved and electrical impedance measurements have demonstrated their basic functionality. The array was then packaged, and acoustic pulse-echo measurements were performed. These results demonstrate that direct patterning of electrodes by photolithography on 1-3 piezocomposite is feasible for fabrication of high-frequency ultrasound arrays. Furthermore, this method is more conducive to mass production than other reported array fabrication techniques.
高频超声需要高空间分辨率进行医学成像。在开发工作在高频(≥30MHz)的超声成像阵列时,一个关键问题是需要对阵列电极进行光刻图案化。为了直接在 1-3 压电器件复合材料上实现这一点,材料不仅需要平面、平行和光滑的表面,还需要一种对化学品、热和真空具有抗性的环氧复合材料填充剂。本文首先报告了通过研磨和抛光对 1-3 压电器件复合材料的表面进行整理。已经获得了极好的表面平整度,材料的平均表面粗糙度低至 3nm,陶瓷/聚合物之间的台阶高度约为 80nm。随后,直接在这些表面上使用光刻工艺对高频阵列元件进行图案化。已经在高频 1-3 压电器件复合材料的研磨和抛光表面上图案化了具有 50μm 元件间距的 30MHz 线性阵列电极图案。获得了极好的电极边缘定义和与复合材料的电接触。复合材料已研磨至最终厚度约为 55μm。已经实现了电极在压电器件复合材料上的良好粘附性,并且电阻抗测量已经证明了它们的基本功能。然后对该阵列进行封装,并进行声脉冲回波测量。这些结果表明,通过光刻直接在 1-3 压电器件复合材料上对电极进行图案化对于制造高频超声阵列是可行的。此外,与其他报道的阵列制造技术相比,这种方法更有利于批量生产。