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激光烧蚀法合成硅纳米颗粒的光学限幅特性研究

Studies on optical limiting characteristics of silicon nanoparticles synthesized by laser ablation.

作者信息

Shukla V, Singh C P, Srivastava A K, Bindra K S

机构信息

Laser Physics Applications Section, Raja Ramanna Centre for Advanced Technology, Indore 452013, India.

出版信息

J Nanosci Nanotechnol. 2012 Jun;12(6):4644-9. doi: 10.1166/jnn.2012.6209.

Abstract

We present synthesis of silicon nanoparticles dispersed in toluene by laser ablation and studies on their optical limiting properties with nanosecond laser pulses at 532 nm. Silicon nanoparticles in toluene show better optical limiting compared to standard optical limiter fullerene C60 in toluene. Optical limiting threshold of silicon nanoparticles is about three times less than that of C60. Detailed studies using Z-scan experiments, angle dependent scattering, intensity dependent transmission and temporal profile measurements indicate that apart from non-linear scattering, nonlinear absorption and nonlinear refraction also contribute to the optical limiting behavior of silicon nanoparticles.

摘要

我们展示了通过激光烧蚀在甲苯中分散的硅纳米颗粒的合成,并研究了它们在532nm纳秒激光脉冲下的光学限幅特性。与甲苯中的标准光学限幅器富勒烯C60相比,甲苯中的硅纳米颗粒表现出更好的光学限幅性能。硅纳米颗粒的光学限幅阈值比C60低约三倍。使用Z扫描实验、角度相关散射、强度相关透射和时间轮廓测量的详细研究表明,除了非线性散射外,非线性吸收和非线性折射也对硅纳米颗粒的光学限幅行为有贡献。

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