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双层石墨烯-六方氮化硼杂化器件中的栅极限定限制。

Gate-defined confinement in bilayer graphene-hexagonal boron nitride hybrid devices.

机构信息

Kavli Institute of Nanoscience, Delft University of Technology, P.O. Box 5046, 2600 GA Delft, The Netherlands.

出版信息

Nano Lett. 2012 Sep 12;12(9):4656-60. doi: 10.1021/nl301986q. Epub 2012 Aug 30.

Abstract

We report on the fabrication and measurement of nanoscale devices that permit electrostatic confinement in bilayer graphene on a substrate. The graphene bilayer is sandwiched between hexagonal boron nitride bottom and top gate dielectrics. Top gates are patterned such that constrictions and islands can be electrostatically induced. The high quality of the devices becomes apparent from the smooth pinch-off characteristics of the constrictions at low temperature with features indicative of conductance quantization. The islands exhibit clear Coulomb blockade and single-electron transport.

摘要

我们报告了纳米器件的制造和测量,这些器件允许在基底上的双层石墨烯中进行静电限制。石墨烯双层被夹在六方氮化硼底部和顶部栅介质之间。顶部栅极被图案化,使得可以静电感应出限制和岛。从低温下限制的平滑夹断特性以及电导量子化的特征可以明显看出器件的高质量。这些岛屿表现出明显的库仑阻塞和单电子输运。

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