Rienstra Robert W, Sultana Nishat, Shih En-Min, Stocker Evan, Watanabe Kenji, Taniguchi Takashi, Richter Curt A, Stroscio Joseph, Zhitenev Nikolai, Ghahari Fereshte
Department of Physics and Astronomy, George Mason University; Fairfax, VA 22030, USA.
Physical Measurement Laboratory, National Institute of Standards and Technology; Gaithersburg, MD 20899, USA.
Phys Rev B. 2025;111(11). doi: 10.1103/physrevb.111.115145.
Here we report on low temperature transport measurements of encapsulated bilayer graphene nano constrictions fabricated employing AFM-based local anodic oxidation (LAO) nanolithography. This technique allows for the creation of constrictions as narrow as 20 nm much smaller than previous studies. In wider constrictions, we observe bulk transport characteristics. However, as the constriction's width is reduced, a transport gap appears. Single quantum dot (QD) formation is observed within the narrowest constriction with addition energies exceeding 100 meV, which surpass previous experiments on patterned QDs. Our results suggest that transport through these narrow constrictions is governed by edge disorder combined with quantum confinement effects. Our findings introduce AFM-LAO lithography as an easy and flexible method for creating nanostructures with tunable electronic properties without relying on patterning techniques such as e-beam lithography.
在此,我们报告了采用基于原子力显微镜(AFM)的局部阳极氧化(LAO)纳米光刻技术制造的封装双层石墨烯纳米缩颈的低温输运测量结果。该技术能够制造出宽度仅为20纳米的缩颈,比以往的研究小得多。在较宽的缩颈中,我们观察到体输运特性。然而,随着缩颈宽度的减小,出现了一个输运能隙。在最窄的缩颈中观察到单量子点(QD)的形成,其附加能量超过100毫电子伏特,超过了以往对图案化量子点的实验结果。我们的结果表明,通过这些狭窄缩颈的输运受边缘无序和量子限制效应的共同支配。我们的发现引入了AFM-LAO光刻技术,这是一种简便灵活的方法,无需依赖电子束光刻等图案化技术就能制造出具有可调电子特性的纳米结构。