Kotel'nikov IRE RAS, Mokhovaya 11/7, 125009 Moscow, Russia.
J Phys Condens Matter. 2012 Oct 3;24(39):395003. doi: 10.1088/0953-8984/24/39/395003. Epub 2012 Aug 22.
Physical properties of the Si(111)-7×7 surface of low-doped n- and p-type Si samples are studied in the liquid helium temperature region by scanning-tunnelling microscopy and spectroscopy. Conduction required for the study is provided by illumination of the surface. Application of illumination completely removes the band bending near the surface and restores the initial population of the surface states. Our results indicate the existence of the energy gap 2Δ = 40 ± 10 meV in the intrinsically populated Si(111)-7×7 surface.
通过扫描隧道显微镜和光谱学研究了低掺杂 n 型和 p 型 Si 样品的 Si(111)-7×7 表面在液氦温度区域的物理性质。研究所需的传导是通过表面的照明提供的。照明的应用完全消除了表面附近的能带弯曲,并恢复了表面态的初始分布。我们的结果表明,本征填充的 Si(111)-7×7 表面存在 2Δ = 40 ± 10 meV 的能隙。