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计算模拟氧对氢化 3C-多孔碳化硅电子态的影响。

Computational simulation of the effects of oxygen on the electronic states of hydrogenated 3C-porous SiC.

机构信息

Instituto Politécnico Nacional, ESIME-Culhuacan, Av, Santa Ana 1000, Mexico, DF 04430, Mexico.

出版信息

Nanoscale Res Lett. 2012 Aug 22;7(1):471. doi: 10.1186/1556-276X-7-471.

Abstract

A computational study of the dependence of the electronic band structure and density of states on the chemical surface passivation of cubic porous silicon carbide (pSiC) was performed using ab initio density functional theory and the supercell method. The effects of the porosity and the surface chemistry composition on the energetic stability of pSiC were also investigated. The porous structures were modeled by removing atoms in the [001] direction to produce two different surface chemistries: one fully composed of silicon atoms and one composed of only carbon atoms. The changes in the electronic states of the porous structures as a function of the oxygen (O) content at the surface were studied. Specifically, the oxygen content was increased by replacing pairs of hydrogen (H) atoms on the pore surface with O atoms attached to the surface via either a double bond (X = O) or a bridge bond (X-O-X, X = Si or C). The calculations show that for the fully H-passivated surfaces, the forbidden energy band is larger for the C-rich phase than for the Si-rich phase. For the partially oxygenated Si-rich surfaces, the band gap behavior depends on the O bond type. The energy gap increases as the number of O atoms increases in the supercell if the O atoms are bridge-bonded, whereas the band gap energy does not exhibit a clear trend if O is double-bonded to the surface. In all cases, the gradual oxygenation decreases the band gap of the C-rich surface due to the presence of trap-like states.

摘要

采用第一性原理密度泛函理论和超胞方法对立方多孔碳化硅(pSiC)的电子能带结构和态密度对化学表面钝化的依赖性进行了计算研究。还研究了多孔率和表面化学组成对 pSiC 能量稳定性的影响。通过在[001]方向上移除原子来构建多孔结构,从而产生两种不同的表面化学:一种完全由硅原子组成,另一种仅由碳原子组成。研究了多孔结构的电子态随表面氧(O)含量的变化。具体而言,通过用表面通过双键(X=O)或桥键(X-O-X,X=Si 或 C)连接到表面的 O 原子取代孔表面上的 H 原子对,来增加 O 含量。计算表明,对于完全 H 钝化表面,富 C 相的禁带比富 Si 相的禁带更大。对于部分氧化的富 Si 表面,能带隙行为取决于 O 键类型。如果 O 原子桥键合,随着超胞中 O 原子数量的增加,能隙会增加,而如果 O 原子与表面双键合,则能隙能量没有明显趋势。在所有情况下,由于存在陷阱状态,逐渐氧化会降低富 C 表面的带隙。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/9f90/3462725/1b37206543f0/1556-276X-7-471-1.jpg

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