Institute of Physics, Chemnitz University of Technology, D-09107 Chemnitz, Germany.
Ultramicroscopy. 2012 Oct;121:25-30. doi: 10.1016/j.ultramic.2012.06.013. Epub 2012 Jul 11.
A method to determine the van der Waals forces from phase-distance curves recorded by atomic force microscopy (AFM) in tapping mode is presented. The relationship between the phase shift and the tip-sample distance is expressed as a function of the product of the Hamaker constant by tip radius. Silica-covered silicon tips are used to probe silica-covered silicon substrate in dry conditions to avoid capillary effects. Tips being assumed spherical, radii are determined in situ by averaging profiles recorded in different directions on hematite nanocrystals acting as nanotemplates, thus accounting for tip anisotropy. Through a series of reproducible measurements performed with tips of various radii (including the in-situ characterization of a damaged tip), a value of (6.3±0.4)×10(-20) J is found for the Hamaker constant of interacting silica surfaces in air, in good agreement with tabulated data. The results demonstrate that the onset of the tip-surface interaction is dominated by the van der Waals forces and that the total force can be modeled in the framework of the harmonic approximation. Based on the tip radius and the Hamaker constant associated to the tip-substrate system, the model is quite flexible. Once the Hamaker constant is known, a direct estimate of the tip size can be achieved whereas when the tip size is known, a quantitative evaluation of the van der Waals force becomes possible on different substrates with a spatial resolution at the nanoscale.
本文提出了一种从原子力显微镜(AFM)在轻敲模式下记录的相移-距离曲线中确定范德华力的方法。相移与针尖-样品距离的关系表示为哈克常数与针尖半径乘积的函数。使用覆盖有二氧化硅的硅针尖在干燥条件下探测覆盖有二氧化硅的硅基底,以避免毛细效应。假设针尖为球形,通过在作为纳米模板的赤铁矿纳米晶体上记录不同方向的轮廓来原位确定半径,从而考虑到针尖各向异性。通过用不同半径的针尖进行一系列可重复的测量(包括对受损针尖的原位特征化),发现相互作用的二氧化硅表面在空气中的哈克常数为(6.3±0.4)×10(-20) J,与表列数据非常吻合。结果表明,针尖-表面相互作用的起始由范德华力主导,并且总力可以在简谐近似的框架内建模。基于与针尖-基底系统相关的针尖半径和哈克常数,该模型非常灵活。一旦知道哈克常数,就可以直接估计针尖的大小,而当知道针尖的大小,就可以在不同的基底上实现对范德华力的定量评估,具有纳米级的空间分辨率。