Valmacco Valentina, Elzbieciak-Wodka Magdalena, Besnard Céline, Maroni Plinio, Trefalt Gregor, Borkovec Michal
Department of Inorganic and Analytical Chemistry, University of Geneva, Sciences II, Quai Ernest-Ansermet 30, 1205 Geneva, Switzerland.
Nanoscale Horiz. 2016 Jul 20;1(4):325-330. doi: 10.1039/c6nh00070c. Epub 2016 May 27.
Force profiles between pairs of silica particles in concentrated aqueous solutions of a monovalent salt are measured using atomic force microscopy (AFM). Under such conditions, the double layer forces are negligible, and the profiles are dominated by van der Waals dispersion forces at larger distances. Heat treatment of the particles strongly influences the strength of dispersion forces. The dispersion force between the particles heated at 1200 °C was strongly attractive, and was characterized by a Hamaker constant of 2.4 × 10 J. This value is in good agreement with the current best theoretical estimate of the Hamaker constant for silica across water. For untreated particles, however, the dispersion force is much weaker and the Hamaker constant is 7 × 10 J. The Hamaker constant can be continuously tuned by adjusting the heating temperature between 1000 and 1200 °C. Such substantial variations of the Hamaker constant are caused by moderate differences in surface roughness on the nanoscale. The root mean square (RMS) of the roughness correlates inversely with the Hamaker constant, whereby the particles treated at 1200 °C have an RMS value of 0.63 nm, while the untreated particles have an RMS value of 2.5 nm. Other effects that could influence the Hamaker constant, such as changes in the degree of crystallinity, porosity, and shape of the particles, could be excluded.
使用原子力显微镜(AFM)测量单价盐浓水溶液中二氧化硅颗粒对之间的力分布。在这种条件下,双层力可忽略不计,且在较大距离时,力分布主要由范德华色散力主导。颗粒的热处理强烈影响色散力的强度。在1200℃加热的颗粒之间的色散力具有很强的吸引力,其哈梅克常数为2.4×10 J。该值与目前对二氧化硅在水中的哈梅克常数的最佳理论估计值非常吻合。然而,对于未处理的颗粒,色散力要弱得多,哈梅克常数为7×10 J。通过在1000℃至1200℃之间调节加热温度,可以连续调节哈梅克常数。哈梅克常数的这种显著变化是由纳米尺度表面粗糙度的适度差异引起的。粗糙度的均方根(RMS)与哈梅克常数成反比,在1200℃处理的颗粒的RMS值为0.63nm,而未处理的颗粒的RMS值为2.5nm。可以排除其他可能影响哈梅克常数的因素,如颗粒结晶度、孔隙率和形状的变化。