Department of Mechanical and Aerospace Engineering, Seoul National University, Seoul 151-742, Korea.
Small. 2013 Jan 28;9(2):193-8. doi: 10.1002/smll.201201554. Epub 2012 Sep 21.
A scalable and pitch-tunable size reduction patterning method is introduced by exploiting the temperature memory effect of shape memory polymer and replica molding of UV-curable materials.
本文提出了一种可扩展且音高可调的尺寸缩小图案化方法,该方法利用形状记忆聚合物的温度记忆效应和紫外光固化材料的复制成型。