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层状 GaS 和 GaSe 中的拓扑相变。

Topological phase transition in layered GaS and GaSe.

机构信息

Physical Sciences and Engineering Division, King Abdullah University of Science and Technology (KAUST), Thuwal 23955-6900, Kingdom of Saudi Arabia.

出版信息

Phys Rev Lett. 2012 Jun 29;108(26):266805. doi: 10.1103/PhysRevLett.108.266805.

Abstract

By fully relativistic first principles calculations, we predict that appropriate strain engineering of layered GaX (X=S, Se) leads to a new class of three-dimensional topological insulators with an excitation gap of up to 135 meV. Our results provide a new perspective on the formation of three-dimensional topological insulators. Band inversion can be induced by strain only, without considering any spin-orbit coupling. The latter, however, is indispensable for the formation of local band gaps at the crossing points of the inverted bands. Our study indicates that three-dimensional topological insulators can also be realized in materials which comprise light elements only.

摘要

通过完全相对论的第一性原理计算,我们预测适当的层状 GaX(X=S,Se)应变工程将导致一类新的具有高达 135meV 的激发能隙的三维拓扑绝缘体。我们的结果为三维拓扑绝缘体的形成提供了一个新的视角。应变只能引起能带反转,而无需考虑任何自旋轨道耦合。然而,对于在反转能带的交点处形成局部带隙来说,自旋轨道耦合是不可或缺的。我们的研究表明,仅由轻元素组成的材料也可以实现三维拓扑绝缘体。

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