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点缺陷对类石墨烯片层结构和电子性质的影响:分子模拟研究。

On the influence of point defects on the structural and electronic properties of graphene-like sheets: a molecular simulation study.

机构信息

Benemérita Universidad Autónoma de Puebla, Av. San Claudio y 18 Sur, 72570, Puebla, Mexico.

出版信息

J Mol Model. 2013 Feb;19(2):839-46. doi: 10.1007/s00894-012-1612-z. Epub 2012 Oct 14.

Abstract

The influence of vacancies and substitutional defects on the structural and electronic properties of graphene, graphene oxide, hexagonal boron nitride, and boron nitride oxide two-dimensional molecular models was studied using density functional theory (DFT) at the level of local density approximation (LDA). Bond length, dipole moment, HOMO-LUMO energy gap, and binding energy were calculated for each system with and without point defects. The results obtained indicate that the formation of a point defect does not necessary lead to structural instability; nevertheless, surface distortions and reconstruction processes were observed, mainly when a vacancy-type defect is generated. For graphene, it was found that incorporation of a point defect results in a semiconductor-semimetal transition and also increases notably its polar character. As with graphene, the formation of a point defect in a hexagonal boron nitride sheet reduces its energy gap, although its influence on the resulting dipole moment is not as dramatic as in graphene. The influence of point defects on the structural and electronic properties of graphene oxide and boron nitride oxide sheets were found to be mediated by the chemisorbed species.

摘要

采用局域密度近似(LDA)下的密度泛函理论(DFT)研究了空位和替位缺陷对石墨烯、氧化石墨烯、六方氮化硼和氮化硼氧化物二维分子模型的结构和电子性质的影响。计算了每个系统在有点缺陷和无点缺陷情况下的键长、偶极矩、HOMO-LUMO 能隙和结合能。结果表明,点缺陷的形成不一定导致结构不稳定;然而,观察到表面变形和重构过程,主要是在产生空位型缺陷时。对于石墨烯,发现点缺陷的掺入导致半导体-金属转变,并且还显著增加了其极性。与石墨烯一样,在六方氮化硼片上形成点缺陷会降低其能隙,尽管其对产生的偶极矩的影响不如在石墨烯中那么显著。点缺陷对氧化石墨烯和氮化硼氧化物片的结构和电子性质的影响被发现受化学吸附物种的调节。

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