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硼掺杂石墨烯上的氢吸附:一项从头算研究。

Hydrogen adsorption on boron doped graphene: an ab initio study.

作者信息

Miwa R H, Martins T B, Fazzio A

机构信息

Instituto de Física, Universidade Federal de Uberlândia, Caixa Postal 593, 38400-902, Uberlândia, MG, Brazil.

出版信息

Nanotechnology. 2008 Apr 16;19(15):155708. doi: 10.1088/0957-4484/19/15/155708. Epub 2008 Mar 12.

Abstract

(i) The electronic and structural properties of boron doped graphene sheets, and (ii) the chemisorption processes of hydrogen adatoms on the boron doped graphene sheets have been examined by ab initio total energy calculations. In (i) we find that the structural deformations are very localized around the boron substitutional sites, and in accordance with previous studies (Endo et al 2001 J. Appl. Phys. 90 5670) there is an increase of the electronic density of states near the Fermi level. Our simulated scanning tunneling microscope (STM) images, for occupied states, indicate the formation of bright (triangular) spots lying on the substitutional boron (center) and nearest-neighbor carbon (edge) sites. Those STM images are attributed to the increase of the density of states within an energy interval of 0.5 eV below the Fermi level. For a boron concentration of ∼2.4%, we find that two boron atoms lying on the opposite sites of the same hexagonal ring (B1-B2 configuration) represents the energetically most stable configuration, which is in contrast with previous theoretical findings. Having determined the energetically most stable configuration for substitutional boron atoms on graphene sheets, we next considered the hydrogen adsorption process as a function of the boron concentration, (ii). Our calculated binding energies indicate that the C-H bonds are strengthened near boron substitutional sites. Indeed, the binding energy of hydrogen adatoms forming a dimer-like structure on the boron doped B1-B2 graphene sheet is higher than the binding energy of an isolated H(2) molecule. Since the formation of the H dimer-like structure may represent the initial stage of the hydrogen clustering process on graphene sheets, we can infer that the formation of H clusters is quite likely not only on clean graphene sheets, which is in consonance with previous studies (Hornekær et al 2006 Phys. Rev. Lett. 97 186102), but also on B1-B2 boron doped graphene sheets. However, for a low concentration of boron atoms, the formation of H dimer structures is not expected to occur near a single substitutional boron site. That is, the formation (or not) of H clusters on graphene sheets can be tuned by the concentration of substitutional boron atoms.

摘要

(i)通过从头算总能量计算研究了硼掺杂石墨烯片的电子和结构性质,以及(ii)氢原子在硼掺杂石墨烯片上的化学吸附过程。在(i)中,我们发现结构变形非常局限于硼替代位点周围,并且与先前的研究(远藤等人,2001年,《应用物理杂志》90卷,5670页)一致,费米能级附近的电子态密度增加。我们针对占据态模拟的扫描隧道显微镜(STM)图像表明,在替代硼(中心)和最近邻碳(边缘)位点上形成了明亮的(三角形)斑点。这些STM图像归因于费米能级以下0.5电子伏特能量区间内态密度的增加。对于硼浓度约为2.4%的情况,我们发现位于同一六边形环相对位点上的两个硼原子(B1 - B2构型)代表能量上最稳定的构型,这与先前的理论发现相反。确定了石墨烯片上替代硼原子的能量上最稳定构型后,接下来我们考虑了氢吸附过程与硼浓度的函数关系,即(ii)。我们计算的结合能表明,在硼替代位点附近C - H键得到加强。实际上,在硼掺杂的B1 - B2石墨烯片上形成二聚体状结构的氢原子的结合能高于孤立H₂分子的结合能。由于H二聚体状结构的形成可能代表石墨烯片上氢聚集过程的初始阶段,我们可以推断,不仅在清洁的石墨烯片上(这与先前的研究一致,霍内凯尔等人,2006年,《物理评论快报》97卷,186102页),而且在B1 - B2硼掺杂的石墨烯片上都很可能形成H团簇。然而,对于低浓度的硼原子,预计在单个替代硼位点附近不会形成H二聚体结构。也就是说,石墨烯片上H团簇的形成(或不形成)可以通过替代硼原子的浓度来调节。

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