Department of Physics, Yunnan University, Kunming, 650091, China.
Nanoscale Res Lett. 2012 Oct 15;7(1):569. doi: 10.1186/1556-276X-7-569.
: In this study, Ni and Cu nanowire arrays and Ni/Cu superlattice nanowire arrays are fabricated using standard techniques such as electrochemical deposition of metals into porous anodic alumina oxide templates having pore diameters of about 50 nm. We perform optical measurements on these nanowire array structures. Optical reflectance (OR) of the as-prepared samples is recorded using an imaging spectrometer in the wavelength range from 400 to 2,000 nm (i.e., from visible to near-infrared bandwidth). The measurements are carried out at temperatures set to be 4.2, 70, 150, and 200 K and at room temperature. We find that the intensity of the OR spectrum for nanowire arrays depends strongly on the temperature. The strongest OR can be observed at about T = 200 K for all samples in visible regime. The OR spectra for these samples show different features in the visible and near-infrared bandwidths. We discuss the physical mechanisms responsible for these interesting experimental findings. This study is relevant to the application of metal nanowire arrays as optical and optoelectronic devices.
在这项研究中，使用标准技术（例如将金属电化学沉积到具有约 50nm 孔径的多孔阳极氧化铝模板中）来制造 Ni 和 Cu 纳米线阵列和 Ni/Cu 超晶格纳米线阵列。我们对这些纳米线阵列结构进行了光学测量。使用成像光谱仪在 400 到 2000nm（即从可见光到近红外带宽）的波长范围内记录了制备样品的光反射率（OR）。测量在设定为 4.2、70、150 和 200K 以及室温的温度下进行。我们发现，纳米线阵列的 OR 光谱强度强烈依赖于温度。在所有样品的可见光范围内，最强的 OR 可以在大约 T=200K 时观察到。这些样品的 OR 光谱在可见光和近红外带宽中显示出不同的特征。我们讨论了导致这些有趣实验结果的物理机制。这项研究与金属纳米线阵列作为光学和光电设备的应用有关。
