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原子尺度上的证据表明,在石墨烯晶界处存在势垒和强载流子散射:扫描隧道显微镜研究。

Atomic-scale evidence for potential barriers and strong carrier scattering at graphene grain boundaries: a scanning tunneling microscopy study.

机构信息

Department of Electrical & Computer Engineering, University of Illinois, Urbana-Champaign, Illinois 61801, USA.

出版信息

ACS Nano. 2013 Jan 22;7(1):75-86. doi: 10.1021/nn302064p. Epub 2013 Jan 2.

Abstract

We use scanning tunneling microscopy and spectroscopy to examine the electronic nature of grain boundaries (GBs) in polycrystalline graphene grown by chemical vapor deposition (CVD) on Cu foil and transferred to SiO(2) substrates. We find no preferential orientation angle between grains, and the GBs are continuous across graphene wrinkles and SiO(2) topography. Scanning tunneling spectroscopy shows enhanced empty states tunneling conductance for most of the GBs and a shift toward more n-type behavior compared to the bulk of the graphene. We also observe standing wave patterns adjacent to GBs propagating in a zigzag direction with a decay length of ~1 nm. Fourier analysis of these patterns indicates that backscattering and intervalley scattering are the dominant mechanisms responsible for the mobility reduction in the presence of GBs in CVD-grown graphene.

摘要

我们使用扫描隧道显微镜和光谱技术来研究化学气相沉积(CVD)在 Cu 箔上生长并转移到 SiO2 衬底上的多晶石墨烯中晶界(GB)的电子性质。我们发现晶粒之间没有优先取向角,并且 GB 在石墨烯褶皱和 SiO2 地形上是连续的。扫描隧道谱表明,大多数 GB 的空态隧穿电导增强,与石墨烯体相比,向 n 型行为的转变。我们还观察到在 GB 附近传播的锯齿形方向上的驻波模式,其衰减长度约为 1nm。对这些模式的傅里叶分析表明,背散射和谷间散射是 CVD 生长的石墨烯中存在 GB 导致迁移率降低的主要机制。

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