Vial Benjamin, Zolla Frédéric, Nicolet André, Commandré Mireille, Tisserand Stéphane
Institut Fresnel, Domaine universitaire de Saint J´erˆome, 13397 Marseille cedex 20, France.
Opt Express. 2012 Dec 17;20(27):28094-105. doi: 10.1364/OE.20.028094.
We propose an Adaptive Perfectly Matched Layer (APML) to be used in diffraction grating modeling. With a properly tailored co-ordinate stretching depending both on the incident field and on grating parameters, the APML may efficiently absorb diffracted orders near grazing angles (the so-called Wood's anomalies). The new design is implemented in a finite element method (FEM) scheme and applied on a numerical example of a dielectric slit grating. Its performances are compared with classical PML with constant stretching coefficient.
我们提出一种自适应理想匹配层（APML）用于衍射光栅建模。通过根据入射场和光栅参数进行适当调整的坐标拉伸，APML可以有效吸收掠射角附近的衍射级次（即所谓的伍德异常）。这种新设计在有限元方法（FEM）方案中实现，并应用于介质狭缝光栅的数值示例。将其性能与具有恒定拉伸系数的经典PML进行了比较。
