Opt Lett. 2013 Nov 15;38(22):4876-9. doi: 10.1364/OL.38.004876.
The study of total light absorption due to excitation of localized surface plasmons on deep metallic crossed gratings having a sinusoidal profile with a two-dimensional periodicity shows a very strong increase in the electric field intensity, reaching 800 times the incident intensity. The region with high intensity is strongly localized at the groove top and is characterized by a volume much smaller than the diffraction limit, both in transverse direction along the grating plane, and in longitudinal direction when going away from the grating surface. The field enhancement and its localization are much more pronounced than in shallow gratings.
对具有二维周期性的正弦轮廓的深金属交叉光栅上的局域表面等离激元激发引起的总光吸收的研究表明，电场强度有了非常大的增强，达到了入射强度的 800 倍。高强度区域强烈地局限在槽口顶部，其特征是在横向方向上沿着光栅平面以及在远离光栅表面的纵向方向上，体积都远小于衍射极限。与浅光栅相比，场增强和局域化更加显著。
