Kamerlingh Onnes Laboratory, Leiden University, Niels Bohrweg 2, 2333CA Leiden, Netherlands.
Angew Chem Int Ed Engl. 2013 Feb 25;52(9):2454-8. doi: 10.1002/anie.201207342. Epub 2013 Jan 23.
Under the microscope: In situ, video-rate scanning-tunneling-microscopy imaging during Cu electrodeposition reveals a profound structural accelerating effect of Cl(-) on the deposition process. This effect could be present in systems with different metals and different additives. The structural accelerating effect is important for the fundamental understanding of electrodeposition phenomena and for applications in industry.
原位、视频速率扫描隧道显微镜成像揭示了 Cl(-) 对 Cu 电沉积过程具有深远的结构加速效应。这种效应可能存在于具有不同金属和不同添加剂的系统中。结构加速效应对于深入理解电沉积现象以及在工业中的应用非常重要。
