Baidakova M V, Bert N A, Chaldyshev V V, Nevedomsky V N, Yagovkina M A, Preobrazhenskii V V, Putyato M A, Semyagin B R
Ioffe Physical-Technical Institute, Politekhnicheskaya 26, 194021 St Petersburg, Russian Federation.
Acta Crystallogr B. 2013 Feb;69(Pt 1):30-5. doi: 10.1107/S0108768113000189. Epub 2013 Jan 19.
The structure of low-temperature grown GaAs with equidistant δ-layers of Sb and P was studied by analysis of the X-ray curves, which was supported by optical absorption measurements and transmission electron microscopy. The simultaneous fitting of the X-ray reflectivity curve and diffraction ones for GaAs (004) and GaAs (115) crystallographic planes provided reliable information about the period of δ-layer superlattice, thickness of the Sb and P δ-layers, and amount of excess As. Variation of these parameters was documented when excess As precipitated into As nanoinclusions upon annealing. The Sb and P δ-layers impact differently on the As precipitation processes in low-temperature grown GaAs. The combination of Sb and P δ-layers appears to be an effective tool for spatial patterning of the nanoinclusion array and prevention of the defect formation under annealing.
通过对X射线曲线的分析研究了具有等间距锑(Sb)和磷(P)δ层的低温生长砷化镓(GaAs)的结构,这得到了光吸收测量和透射电子显微镜的支持。对GaAs(004)和GaAs(115)晶面的X射线反射率曲线和衍射曲线进行同时拟合,提供了关于δ层超晶格周期、Sb和Pδ层厚度以及过量砷含量的可靠信息。当过量的砷在退火时沉淀形成砷纳米夹杂物时,记录了这些参数的变化。Sb和Pδ层对低温生长GaAs中的砷沉淀过程有不同的影响。Sb和Pδ层的组合似乎是一种用于纳米夹杂物阵列空间图案化以及防止退火时形成缺陷的有效工具。