Ren Lingling, Gao Huifang, Yuan Aili
National Institute of Metrology, China, Beijing 100013, China.
J Nanosci Nanotechnol. 2013 Feb;13(2):761-5. doi: 10.1166/jnn.2013.6090.
The effects of growth conditions on the structural properties of the GaAs/AlAs superlattices were investigated by grazing incidence X-ray reflectivity (GIXRR), transmission electron microscopy (TEM), Auger electron spectroscopy (AES) and X-ray photoelectron spectroscopy (XPS). The GaAs/AlAs superlattices were prepared by molecular beam epitaxy (MBE) at different growth temperatures (500 degrees C, 600 degrees C and 660 degrees C) and growth rates (1.0 microm/h and 0.7 microm/h for GaAs). And the thicknesses, surface/interface roughnesses and densities of the GaAs/AlAs superlattices were obtained by GIXRR by fitting the whole spectral reflectance curves based on the Parratt recurrence formula. The homogeneity of samples was also studied at different growth conditions. The results indicate that the superlattices grown at a high temperature and large growth rate ratio (rate of AlAs to that of GaAs) possess better structure and more homogeneity.
通过掠入射X射线反射率(GIXRR)、透射电子显微镜(TEM)、俄歇电子能谱(AES)和X射线光电子能谱(XPS)研究了生长条件对GaAs/AlAs超晶格结构性质的影响。采用分子束外延(MBE)在不同生长温度(500℃、600℃和660℃)和生长速率(GaAs为1.0μm/h和0.7μm/h)下制备了GaAs/AlAs超晶格。通过基于Parratt递推公式拟合整个光谱反射率曲线,利用GIXRR获得了GaAs/AlAs超晶格的厚度、表面/界面粗糙度和密度。还研究了不同生长条件下样品的均匀性。结果表明,在高温和大生长速率比(AlAs与GaAs的生长速率之比)下生长的超晶格具有更好的结构和更高的均匀性。