Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology, Daejon, 305-701, Republic of Korea.
Phys Chem Chem Phys. 2013 Mar 21;15(11):3718-24. doi: 10.1039/c3cp44017f.
The effect of surface characteristics of dielectric layers on the molecular orientation and device performance of sprayed organic field-effect transistors (OFETs) obtained by a novel solvent-assisted post-treatment, called the solvent-sprayed overlayer (SSO) method, were investigated. The OFETs were fabricated by the spray method using regioregular poly(3-hexylthiophene) (RR-P3HT) as an active material. The SSO treatment was applied on the as-sprayed active layers to arrange the molecular ordering. Bare thin SiO(2) layers and octadecyltrichlorosilane (OTS)-treated SiO(2) (OTS-SiO(2)) were employed as the dielectric materials. The resulting chain orientation, crystallinity, and device performance were correlated as a function of SSO treatment and dielectric layers. The intrinsic limitation of spray methods for polymer film formation was overcome regardless of the type of dielectric layer using the SSO treatment. The orientation direction of RR-P3HT was controlled by SSO treatment to an edge-on dominant orientation that is preferential for charge transport, regardless of the type of dielectric layer. The crystal growth was further enhanced on the OTS-SiO(2) layers because of the reduced nucleation sites. These effects were successfully reflected in the device performance, including an orders-of-magnitude increase in charge mobility. The SSO method is a powerful external treatment method for reorienting the molecular ordering of solidified active films of OFETs to the preferential edge-on packing. The growth of crystals was further optimized by controlling the surface characteristics of the dielectric layers. The purpose of this study was to find the full capabilities of the SSO treatment method that will facilitate the development of high-throughput, large-area organic electronic device manufacturing.
通过一种称为溶剂喷涂覆盖(SSO)方法的新型溶剂辅助后处理,研究了介电层的表面特性对通过喷涂有机场效应晶体管(OFET)获得的分子取向和器件性能的影响。该 OFET 通过喷涂方法使用具有规整形的聚(3-己基噻吩)(RR-P3HT)作为活性材料制成。SSO 处理应用于喷涂的活性层以排列分子有序。使用裸的薄二氧化硅(SiO2)层和十八烷基三氯硅烷(OTS)处理的 SiO2(OTS-SiO2)作为介电材料。将所得的链取向、结晶度和器件性能与 SSO 处理和介电层的功能相关联。通过 SSO 处理克服了喷涂方法在聚合物膜形成方面的固有局限性,与介电层的类型无关。RR-P3HT 的取向方向通过 SSO 处理控制到有利于电荷输运的边缘主导取向。由于成核点减少,在 OTS-SiO2 层上进一步增强了晶体生长。这些影响成功地反映在器件性能中,包括电荷迁移率提高了几个数量级。SSO 方法是一种强大的外部处理方法,可将 OFET 固化活性膜的分子取向重新定向为优先的边缘取向堆积。通过控制介电层的表面特性,进一步优化了晶体的生长。本研究的目的是发现 SSO 处理方法的全部潜力,以促进高通量、大面积有机电子器件制造的发展。