Institute of Materials Engineering, National Taiwan Ocean University, Keelung 20224, Taiwan.
Nanoscale. 2013 Mar 21;5(6):2346-51. doi: 10.1039/c3nr33159h.
This study presents the synthesis of high-density aligned wurtzite ZnO nanostructures using thermal evaporation on perovskite (La,Sr)MnO3(LSMO) epitaxy to form a heterostructure without the assistance of metallic catalysis. LSMO epitaxial films are RF-sputtered with various crystal qualities to examine the correlation between the interface and electrical characteristics of the heterostructures. The ZnO nanostructures-LSMO epitaxial heterostructures show electrical rectifying behavior without inserting an ultrathin insulating layer at the hetero-interface. Misfit strain, intrinsic strain, and crystal defects are major factors in causing a phase separation in the as-prepared manganite LSMO epitaxial films. The coexistence of a charge-ordered insulating domain and a ferromagnetic metallic domain causes inhomogeneous electrical contact at the ZnO-LSMO heterointerfaces, further deteriorating the junction characteristics. A high-temperature annealing procedure and moderate LSMO epitaxy film thickness are required for the construction of an efficient ZnO nanostructures-LSMO epitaxy junction.
本研究采用热蒸发法在钙钛矿(La,Sr)MnO3(LSMO)外延层上合成了高密度排列的纤锌矿 ZnO 纳米结构,无需金属催化即可形成异质结。使用射频溅射法在不同晶体质量的 LSMO 外延薄膜上沉积,以研究界面与异质结的电特性之间的相关性。ZnO 纳米结构-LSMO 外延异质结表现出整流行为,无需在异质界面插入超薄绝缘层。失配位错、本征应变和晶体缺陷是导致预制备的锰氧化物 LSMO 外延薄膜相分离的主要因素。电荷有序绝缘畴和铁磁金属畴的共存导致 ZnO-LSMO 异质结界面上不均匀的电接触,进一步恶化了结的特性。为了构建高效的 ZnO 纳米结构-LSMO 外延结,需要进行高温退火处理和适度的 LSMO 外延膜厚度。