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铋纳米线从铋/钴不混溶复合薄膜生长的机制。

The mechanism of Bi nanowire growth from Bi/Co immiscible composite thin films.

作者信息

Volobuev Valentine V, Dziawa Piotr, Stetsenko Alexander N, Zubarev Eugene N, Savitskiy Boris A, Samburskaya Tatyana A, Reszka Anna, Story Tomasz, Sipatov Alexander Yu

机构信息

National Technical University "Kharkiv Polytechnic Institute," Frunze Street 21, Kharkiv 61002, Ukraine.

出版信息

J Nanosci Nanotechnol. 2012 Nov;12(11):8624-9. doi: 10.1166/jnn.2012.6835.

Abstract

Single crystalline Bi nanowires were grown by extrusion from Bi/Co thin films. The films were obtained by thermal evaporation in high vacuum. The average diameter, length and density of obtained nanowires were 100 nm, 30 microm and 6.5 x 10(5) cm(-2), respectively. The non-catalyzed self-organized process of whisker formation on the surface of immiscible composite thin film was exploited for nanowire growth. It was shown that the whiskers had formed during and after a thin film deposition. The value of residual stresses in a whole thin film coating as well as in its bismuth component was measured using X-ray diffraction technique. It was revealed that local compressive stresses, that had induced the whisker growth, had been formed by a segregation of Bi layers into Bi globules. A simple model of the whisker formation to minimize free energy in the Bi/Co system was proposed taking into account interfacial and elastic deformation energies. The obtained results can be utilized for growing of nanowires of other low-melting-point metals and semiconductors from immiscible composite thin films.

摘要

通过从Bi/Co薄膜中挤压生长出了单晶铋纳米线。这些薄膜是在高真空下通过热蒸发获得的。所获得的纳米线的平均直径、长度和密度分别为100纳米、30微米和6.5×10⁵厘米⁻²。利用不混溶复合薄膜表面晶须形成的非催化自组织过程来生长纳米线。结果表明,晶须在薄膜沉积期间和之后形成。使用X射线衍射技术测量了整个薄膜涂层及其铋成分中的残余应力值。结果表明,诱导晶须生长的局部压应力是由铋层偏析成铋球而形成的。考虑到界面能和弹性变形能,提出了一个在Bi/Co系统中使自由能最小化的晶须形成简单模型。所获得的结果可用于从不混溶复合薄膜中生长其他低熔点金属和半导体的纳米线。

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