National Research Council of Canada, 1200 Montreal Road, Ottawa, Ontario K1A 0R6, Canada.
Biotechnol Bioeng. 2013 Aug;110(8):2236-41. doi: 10.1002/bit.24887. Epub 2013 May 29.
We present a dry lift-off method using a chemically resistant spin-on plastic, polyimide, to pattern surfaces with high accuracy and resolution. Using well-known lithographic and reactive ion etching techniques, the spin-on polymer is patterned over a silicon dioxide surface. The plastic efficiently adheres to the silicon dioxide surface during the chemical modification and is readily lifted-off following the derivatization process, permitting highly reliable surface derivatization. The verticality of the reactive ion etch enables sub-micrometer features to be patterned, down to 0.8 µm. The technique is used to pattern neurons on silicon dioxide surfaces: efficient neuron placement over a 4 mm area is shown for patterns larger than 50 µm while process guidance is shown for 10 µm patterns.
我们提出了一种使用耐腐蚀的旋涂塑料聚酰亚胺的干法脱模方法，以高精度和高分辨率对表面进行图案化。通过使用众所周知的光刻和反应离子刻蚀技术，将旋涂聚合物图案化在二氧化硅表面上。在化学修饰过程中，该塑料有效地附着在二氧化硅表面上，并且在衍生化过程之后很容易脱模，从而实现了高度可靠的表面衍生化。反应离子刻蚀的垂直度可实现亚微米特征的图案化，最小可达 0.8 µm。该技术用于在二氧化硅表面上对神经元进行图案化：对于大于 50 µm 的图案，展示了在 4 mm 面积上有效放置神经元的能力，同时还展示了对于 10 µm 图案的处理指导。
