Tonndorf Philipp, Schmidt Robert, Böttger Philipp, Zhang Xiao, Börner Janna, Liebig Andreas, Albrecht Manfred, Kloc Christian, Gordan Ovidiu, Zahn Dietrich R T, Michaelis de Vasconcellos Steffen, Bratschitsch Rudolf
Institute of Physics, Chemnitz University of Technology, 09107 Chemnitz, Germany.
Opt Express. 2013 Feb 25;21(4):4908-16. doi: 10.1364/OE.21.004908.
We mechanically exfoliate mono- and few-layers of the transition metal dichalcogenides molybdenum disulfide, molybdenum diselenide, and tungsten diselenide. The exact number of layers is unambiguously determined by atomic force microscopy and high-resolution Raman spectroscopy. Strong photoluminescence emission is caused by the transition from an indirect band gap semiconductor of bulk material to a direct band gap semiconductor in atomically thin form.
我们通过机械方法剥离出单层和少数层的过渡金属二硫属化物,包括二硫化钼、二硒化钼和二硒化钨。层数的确切数量可通过原子力显微镜和高分辨率拉曼光谱明确确定。强烈的光致发光发射是由体材料的间接带隙半导体向原子级薄形式的直接带隙半导体的转变引起的。