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二硫化钼/石墨烯范德华异质结构中的可调激子调制与高效电荷转移

Tunable Exciton Modulation and Efficient Charge Transfer in MoS/Graphene van der Waals Heterostructures.

作者信息

Ghaebi Omid, Hamzayev Tarlan, Weickhardt Till, Ramzan Muhammad Sufyan, Taniguchi Takashi, Watanabe Kenji, Cocchi Caterina, De Fazio Domenico, Soavi Giancarlo

机构信息

Institute of Solid State Physics, Friedrich Schiller University Jena, Jena 07743, Germany.

Institute of Physics, Carl von Ossietzky Universität Oldenburg, Oldenburg 26129, Germany.

出版信息

ACS Nano. 2025 May 27;19(20):19027-19034. doi: 10.1021/acsnano.4c17354. Epub 2025 May 15.

Abstract

Monolayer transition metal dichalcogenides (TMDs) are direct gap semiconductors where the optical properties are dominated by strongly interacting electron-hole quasi-particles. Understanding the interactions among these quasi-particles is crucial for advancing optoelectronic applications. Here, we examine the electrical tunability of light emission from the A and B excitons in monolayer MoS and MoS/graphene heterostructures and unravel the competition between the A exciton to trion formation and charge transfer processes. Our results show significant gate-tunable quenching of the photoluminescence intensity from A excitons with notable differences due to charge transfer in the heterostructure. Furthermore, we observe a distinct superlinear correlation between the A exciton photoluminescence intensity and high doping levels in MoS, which continues until the density of photoexcited excitons exceeds and saturates the free carrier density. This phenomenon ceases to occur in MoS/graphene, where MoS remains almost undoped across all values of the applied external voltage. In contrast, the B exciton photoluminescence is unaffected by doping in MoS, while it decreases analogously to that of the A excitons in the MoS/graphene heterostructure, indicating the relevance of gate-tunable charge transfer from hot electrons before any internal recombination.

摘要

单层过渡金属二硫属化物(TMDs)是直接带隙半导体,其光学性质由强相互作用的电子 - 空穴准粒子主导。理解这些准粒子之间的相互作用对于推进光电子应用至关重要。在此,我们研究了单层MoS₂和MoS₂/石墨烯异质结构中A和B激子发光的电学可调性,并揭示了A激子到三重子形成与电荷转移过程之间的竞争。我们的结果表明,由于异质结构中的电荷转移,A激子的光致发光强度出现了显著的栅极可调淬灭,且存在明显差异。此外,我们观察到MoS₂中A激子光致发光强度与高掺杂水平之间存在明显的超线性相关性,这种相关性一直持续到光激发激子的密度超过并饱和自由载流子密度。在MoS₂/石墨烯中这种现象不再发生,在施加的所有外部电压值下,MoS₂几乎保持未掺杂状态。相比之下,MoS₂中B激子的光致发光不受掺杂影响,而在MoS₂/石墨烯异质结构中,它与A激子类似地降低,这表明在任何内部复合之前,来自热电子的栅极可调电荷转移具有相关性。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/8474/12120984/b502ee3905b3/nn4c17354_0001.jpg

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