Zhu Shiyang, Lo G Q, Kwong D L
Institute of Microelectronics, A*STAR (Agency for Science, Technology and Research), 11 Science Park Road, Science Park-II, 117685 Singapore.
Opt Express. 2013 Apr 8;21(7):8320-30. doi: 10.1364/OE.21.008320.
An extremely compact Si phase modulator is proposed and validated, which relies on effective modulation of the real part of modal index of horizontal metal-insulator-Si-insulator-metal plasmonic waveguides by a voltage applied between the metal cover and the Si core. Proof-of-concept devices are fabricated on silicon-on-insulator substrates using standard complementary metal-oxide-semiconductor technology using copper as the metal and thermal silicon dioxide as the insulator. A modulator with a 1-μm-long phase shifter inserted in an asymmetric Si Mach-Zehnder interferometer exhibits 9-dB extinction ratio under a 6-V/10-kHz voltage swing. Numerical simulations suggest that high speed and low driving voltage could be achieved by shortening the distance between the Si core and the n(+)-contact and by using a high-κ dielectric as the insulator, respectively.
提出并验证了一种极其紧凑的硅相位调制器,它通过在金属覆盖层和硅芯之间施加电压,对水平金属 - 绝缘体 - 硅 - 绝缘体 - 金属等离子体波导的模式折射率实部进行有效调制。使用标准互补金属氧化物半导体技术,以铜为金属、热生长二氧化硅为绝缘体,在绝缘体上硅衬底上制造了概念验证器件。在非对称硅马赫 - 曾德尔干涉仪中插入一个1μm长移相器的调制器,在6V/10kHz的电压摆幅下,消光比为9dB。数值模拟表明,分别通过缩短硅芯与n(+)接触之间的距离以及使用高介电常数电介质作为绝缘体,可以实现高速和低驱动电压。