This paper describes a tilted-target RF magnetron sputter deposition system to grow nanoparticles in a controlled way. With detailed characterization of ultra-high density (up to 1.1 × 10¹³ cm⁻²) and ultra-small size Pt nanoparticles (0.5-2 nm), it explains their growth and crystalline properties on amorphous Al₂O₃ thin films. It is shown that Pt nanoparticle size and number density can be precisely engineered by varying selected experimental parameters such as target angle, sputtering power and time of deposition to control the energy of the metal atoms in the deposition flux. Based on rate equation modelling of nanoparticle growth, three distinct growth regimes, namely nucleation dependent, coalescence dependent and agglomeration dependent regimes, were observed. The correlation between different nanoparticle growth regimes and the consequent crystal structure transformation, non-crystalline clusters → single crystalline nanoparticles → polycrystalline islands, is also discussed.