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非晶态透明掺钛氧化钨薄膜的光学常数。

Optical constants of amorphous, transparent titanium-doped tungsten oxide thin films.

机构信息

Department of Mechanical Engineering, University of Texas at El Paso, El Paso, Texas 79968, United States.

出版信息

ACS Appl Mater Interfaces. 2013 Jun 12;5(11):4659-66. doi: 10.1021/am4006258. Epub 2013 May 17.

Abstract

We report on the optical constants and their dispersion profiles determined from spectroscopic ellipsometry (SE) analysis of the 20%-titanium (Ti) doped of tungsten oxide (WO3) thin films grown by sputter-deposition. The Ti-doped WO3 films grown in a wide range of temperatures (25-500 °C) are amorphous and optically transparent. SE data indicates that there is no significant interdiffusion at the film-substrate interface for a W-Ti oxide film growth of ~90 nm. The index refraction (n) at λ = 550 nm vary in the range of 2.17-2.31 with a gradual increase in growth temperature. A correlation between the growth conditions and optical constants is discussed.

摘要

我们报告了通过光谱椭圆偏振法(SE)分析溅射沉积生长的 20%-钛(Ti)掺杂氧化钨(WO3)薄膜确定的光学常数及其色散曲线。在很宽的温度范围内(25-500°C)生长的 Ti 掺杂 WO3 薄膜是无定形的和光学透明的。SE 数据表明,对于生长约 90nm 的 W-Ti 氧化物膜,在膜-衬底界面处没有明显的互扩散。在 λ = 550nm 处的折射率(n)在 2.17-2.31 的范围内变化,随着生长温度的升高逐渐增加。讨论了生长条件和光学常数之间的相关性。

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