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通过脉冲激光沉积制备的具有可调光学特性的超均匀PbLa(ZrTi)O₃薄膜。

Ultra Uniform PbLa(ZrTi)O₃ Thin Films with Tunable Optical Properties Fabricated via Pulsed Laser Deposition.

作者信息

Jiang Shenglin, Huang Chi, Gu Honggang, Liu Shiyuan, Zhu Shuai, Li Ming-Yu, Yao Lingmin, Wu Yunyi, Zhang Guangzu

机构信息

School of Optical and Electronic Information, Engineering Research Center for Functional Ceramics, Ministry of Education, Huazhong University of Science and Technology, Wuhan 430074, China.

State Key Laboratory of Digital Manufacturing Equipment and Technology, Huazhong University of Science and Technology, Wuhan 430074, China.

出版信息

Materials (Basel). 2018 Mar 29;11(4):525. doi: 10.3390/ma11040525.

Abstract

Ferroelectric thin films have been utilized in a wide range of electronic and optical applications, in which their morphologies and properties can be inherently tuned by a qualitative control during growth. In this work, we demonstrate the evolution of the PbLa(ZrTi)O₃ (PLZT) thin films on MgO (200) with high uniformity and optimized optical property via the controls of the deposition temperatures and oxygen pressures. The perovskite phase can only be obtained at the deposition temperature above 700 °C and oxygen pressure over 50 Pa due to the improved crystallinity. Meanwhile, the surface morphologies gradually become smooth and compact owing to spontaneously increased nucleation sites with the elevated temperatures, and the crystallization of PLZT thin films also sensitively respond to the oxygen vacancies with the variation of oxygen pressures. Correspondingly, the refractive indices gradually develop with variations of the deposition temperatures and oxygen pressures resulted from the various slight loss, and the extinction coefficient for each sample is similarly near to zero due to the relatively smooth morphology. The resulting PLZT thin films exhibit the ferroelectricity, and the dielectric constant sensitively varies as a function of electric filed, which can be potentially applied in the electronic and optical applications.

摘要

铁电薄膜已被广泛应用于各种电子和光学应用中,在这些应用中,它们的形貌和性能可以在生长过程中通过定性控制进行固有调节。在这项工作中,我们通过控制沉积温度和氧气压力,展示了在MgO(200)上具有高均匀性和优化光学性能的PbLa(ZrTi)O₃(PLZT)薄膜的演变。由于结晶度提高,只有在沉积温度高于700°C和氧气压力超过50 Pa时才能获得钙钛矿相。同时,由于温度升高自发增加了成核位点,表面形貌逐渐变得光滑致密,并且PLZT薄膜的结晶也随着氧气压力的变化对氧空位敏感响应。相应地,由于各种轻微损耗,折射率随着沉积温度和氧气压力的变化而逐渐变化,并且由于形貌相对光滑,每个样品的消光系数同样接近零。所得的PLZT薄膜表现出铁电性,并且介电常数随电场敏感变化,这在电子和光学应用中具有潜在应用价值。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/9e87/5951371/b417ef89f135/materials-11-00525-g001.jpg

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