Graduate School of Nanoscience and Technology (WCU), KAIST, 335 Gwahak-ro, Yuseong-Gu, Daejeon, 305-701, Korea.
Phys Chem Chem Phys. 2013 Jul 14;15(26):10659-65. doi: 10.1039/c3cp50630d. Epub 2013 May 21.
In this work we describe three different trends of pore growth for anodic aluminum oxide nanopores based on their dependence on prepatterned interpore distances. Nanopatterned hexagonal concave arrays were formed by focused ion beam (FIB) lithography on aluminum foil with interpore distances in the range of 100 to 240 nm and the Al foil was anodized under the standard conditions known to result in a 100 nm interpore distance. This method allowed a systematic investigation of pore formation under the non-equilibrium conditions created by the FIB prepatterning. The pore diameter and the pore growth direction, which are affected by the interpore distance, were measured by scanning electron microscopy (SEM) and transmission electron microscopy (TEM) analysis with ion milling. When the interpore distance increases from 100 to 140 nm, the pore diameter becomes larger and nanopores are slightly tilted but maintained the interpore distance and straightness. As the interpore distance increases from 150 to 180 nm, the pore diameter becomes smaller and each nanopore starts to split into two nanopores. At interpore distances of over 190 nm, prepatterned concaves are developed into round flask-shaped nanosacks instead of one-dimensional tubes, and then these are split into three more sub-nanopores. The fundamental characteristics of anodic aluminum oxidation are discussed in accordance with various prepatterned concaves in the nanopore growth processes, providing a rational theory for the design of various complex 3-D AAO structures that can be controlled by prepatterning.
在这项工作中,我们根据其与预先设定的孔间距离的依赖性,描述了基于阳极氧化铝纳米孔的三种不同的孔生长趋势。通过聚焦离子束(FIB)光刻在铝箔上形成具有 100 至 240nm 范围内的孔间距离的纳米图案化六边形凹面阵列,并且已知在标准条件下将 Al 箔阳极氧化会导致 100nm 的孔间距离。这种方法允许在 FIB 预图案化产生的非平衡条件下对孔形成进行系统研究。通过扫描电子显微镜(SEM)和离子铣削的透射电子显微镜(TEM)分析测量了孔径和孔生长方向,这些方向受孔间距离的影响。当孔间距离从 100nm 增加到 140nm 时,孔径变大,纳米孔略微倾斜,但保持孔间距离和直线度。当孔间距离从 150nm 增加到 180nm 时,孔径变小,每个纳米孔开始分裂成两个纳米孔。在孔间距离超过 190nm 时,预先图案化的凹面会发展成圆形瓶形纳米袋而不是一维管,然后这些纳米袋会分裂成三个更小的亚纳米孔。根据纳米孔生长过程中各种预先图案化的凹面,讨论了阳极氧化铝氧化的基本特征,为通过预图案化控制的各种复杂 3-D AAO 结构的设计提供了合理的理论。