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Low cost wafer metrology using a NIR low coherence interferometry.

作者信息

Kim Young Gwang, Seo Yong Bum, Joo Ki-Nam

机构信息

Department of Photonics Engineering, Chosun University, Dong-gu, Gwanju, Republic of Korea.

出版信息

Opt Express. 2013 Jun 3;21(11):13648-55. doi: 10.1364/OE.21.013648.

DOI:10.1364/OE.21.013648
PMID:23736617
Abstract

In this investigation, a low cost Si wafer metrology system based on low coherence interferometry using NIR light is proposed and verified. The whole system consists of two low coherence interferometric principles: low coherence scanning interferometry (LCSI) for measuring surface profiles and spectrally-resolved interferometry (SRI) to obtain the nominal optical thickness of the double-sided polished Si wafer. The combination of two techniques can reduce the measurement time and give adequate dimensional information of the Si wafer. The wavelength of the optical source is around 1 μm, for which transmission is non-zero for undoped silicon and can be also detected by a typical CCD camera. Because of the typical CCD camera, the whole system can be constructed inexpensively.

摘要

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