用于薄膜结构测量与检测的光学层析成像技术的最新进展。

Recent Progress on Optical Tomographic Technology for Measurements and Inspections of Film Structures.

作者信息

Joo Ki-Nam, Park Hyo-Mi

机构信息

3D Optical Metrology Laboratory, Department of Photonic Engineering, Chosun University, 309 Pilmun-daero, Dong-gu, Gwangju 61452, Korea.

出版信息

Micromachines (Basel). 2022 Jul 7;13(7):1074. doi: 10.3390/mi13071074.

DOI:10.3390/mi13071074

PMID:35888891

原文链接:https://pmc.ncbi.nlm.nih.gov/articles/PMC9323294/

Abstract

In this review, we present the recent progress on film metrology focused on the advanced and novel technologies during the last two decades. This review consists of various technologies and their measurement schemes to provide the inspiration for understanding each of the measurement principles and applications. In the technology and analysis section, several optical techniques used in film metrology are introduced and described with their benefits and limitations. The temporal, spatial and snapshot measurement schemes of optical film metrology are introduced in the measurement scheme section, and finally, the prospect on optical film metrology will be provided and discussed with the technology trend.

摘要

在本综述中，我们介绍了过去二十年来聚焦于先进和新颖技术的薄膜计量学的最新进展。本综述包含各种技术及其测量方案，以提供理解每种测量原理和应用的灵感。在技术与分析部分，介绍并描述了薄膜计量学中使用的几种光学技术及其优缺点。测量方案部分介绍了光学薄膜计量学的时间、空间和快照测量方案，最后，将结合技术趋势对光学薄膜计量学的前景进行探讨。