Institut de Science des Matériaux de Mulhouse, CNRS-UMR 7361, Université de Haute-Alsace, Mulhouse, France.
J Phys Condens Matter. 2013 Jun 26;25(25):256007. doi: 10.1088/0953-8984/25/25/256007. Epub 2013 Jun 6.
We report on the first all-epitaxial ferromagnet/inorganic semiconductor/ferromagnet hybrid heterostructure that exhibits (i) a Ge barrier of diamond crystal structure, (ii) room-temperature ferromagnetic electrodes and (iii) very smooth interfaces. Both bottom- and top-Fe-Ge electrodes exhibit tiny in-plane magnetic anisotropies dominated by a magnetocrystalline contribution of six-fold symmetry originating from the hexagonal symmetry of the B82 (Ni2In) β-Fe-Ge phase. A key result is the absence of any magnetic coupling between these soft-magnetic electrodes for Ge barrier thickness as low as ~2.5 nm, which allows us to easily tune the parallel and antiparallel magnetic alignments by applying suitably small magnetic fields. This confirms the beneficial use of H-surfactant in order to drastically reduce the roughness of the Ge barrier, as revealed by our scanning tunneling microscopy and transmission electron microscopy measurements. This new all-epitaxial ferromagnet/semiconductor hybrid system appears, therefore, to be a promising candidate for the realization of magnetic tunnel junctions with a single crystal semiconductor barrier that are fully compatible with Si-based technology.
我们报告了首例全外延铁磁体/无机半导体/铁磁体杂化异质结构,其具有(i)金刚石结构的 Ge 势垒,(ii)室温铁磁体电极,以及(iii)非常平滑的界面。底部和顶部的 Fe-Ge 电极均表现出微小的面内各向异性,主要由源自 B82 (Ni2In) β-Fe-Ge 相的六重对称的磁晶各向异性引起。一个关键的结果是,对于低至约 2.5nm 的 Ge 势垒厚度,这些软磁电极之间不存在任何磁耦合,这使得我们可以通过施加适当小的磁场来轻松地调整平行和反平行的磁排列。这证实了使用 H 型表面活性剂的有益效果,从而大大降低了 Ge 势垒的粗糙度,这一点从我们的扫描隧道显微镜和透射电子显微镜测量中可以得到证实。因此,这种新的全外延铁磁体/半导体杂化系统似乎是实现具有单晶半导体势垒的磁性隧道结的有前途的候选者,这种磁性隧道结完全与 Si 基技术兼容。