College of Polymer Science and Engineering, State Key Laboratory of Polymer Materials and Engineering, Sichuan University, Chengdu 610065, China.
Langmuir. 2013 Jul 2;29(26):8311-9. doi: 10.1021/la401201w. Epub 2013 Jun 20.
A photoresponsive molecularly imprinted system was prepared on a silicon wafer substrate surface via the host-guest complex of grafted 4-(3-triethoxysilylpropyiureido)azobenzene (TSUA) and mono-6-deoxy-6-((p-chlorosulfonyl)-benzoic acid)-β-cyclodextrin (CBA-β-CD), and the acid-base pair interactions/hydrogen bonds between CBA-β-CD and the template molecules, including theophylline (TPE) and 4-hydroxybenzoic acid (4-HA). A molecular imprinting cycle "imprinting → extracting → uptaking → shuffling" was also defined in the study, the processes of uptaking and shuffling were investigated in detail by equilibrium binding experiments, and the Langmuir adsorption isotherm and Scatchard equation were used to evaluate the binding affinity and the theoretical binding sites of the molecularly imprinted (MIS), nonimprinted (NIS), and pure (PS) silicon wafer substrates. Compared with the NISs and PSs, the MISs showed a significantly higher adsorption capacity for the template molecules. More importantly, the MISs showed a reimprinted ability; after the process of shuffling, the molecularly imprinted systems on the substrate surface were destroyed, and new imprinted systems could be fabricated for the recognition of other template molecules after washing the substrates under irradiation at 450 nm. Moreover, the selective adsorption for the MISs was investigated, which indicated that the MISs showed specific affinity to the template molecules (TPE or 4-HA).
通过接枝 4-(3-三乙氧基硅丙基)脒基偶氮苯（TSUA）和单-6-去氧-6-（对氯磺酰基）苯甲酸-β-环糊精（CBA-β-CD）的主体-客体配合物，在硅片基底表面制备了光响应性分子印迹体系，并且模板分子（茶碱（TPE）和 4-羟基苯甲酸（4-HA））之间存在 CBA-β-CD 的酸碱对相互作用/氢键。在本研究中还定义了分子印迹循环“印迹→提取→吸收→洗牌”，通过平衡结合实验详细研究了吸收和洗牌过程，使用 Langmuir 吸附等温线和 Scatchard 方程评估了分子印迹（MIS）、非印迹（NIS）和纯（PS）硅片基底的结合亲和力和理论结合位点。与 NISs 和 PSs 相比，MISs 对模板分子表现出显著更高的吸附能力。更重要的是，MISs 表现出再印迹能力；在洗牌过程之后，在 450nm 光照下洗涤基底后，基底表面的分子印迹体系被破坏，可以为识别其他模板分子制备新的印迹体系。此外，还研究了 MISs 的选择性吸附，表明 MISs 对模板分子（TPE 或 4-HA）表现出特异性亲和力。
