Department of Precision Science and Technology, Graduate School of Engineering, Osaka University, 2-1 Yamada-oka, Suita, Osaka 565-0871, Japan.
Nanoscale Res Lett. 2013 Jun 7;8(1):275. doi: 10.1186/1556-276X-8-275.
Absolute flatness of three silicon plane mirrors have been measured by a three-intersection method based on the three-flat method using a near-infrared interferometer. The interferometer was constructed using a near-infrared laser diode with a 1,310-nm wavelength light where the silicon plane mirror is transparent. The height differences at the coordinate values between the absolute line profiles by the three-intersection method have been evaluated. The height differences of the three flats were 4.5 nm or less. The three-intersection method using the near-infrared interferometer was useful for measuring the absolute flatness of the silicon plane mirrors.
已使用近红外干涉仪基于三平面法通过三交点法测量了三块硅平面反射镜的绝对平整度。干涉仪由近红外激光二极管构成,使用 1310nm 波长的光,硅平面反射镜是透明的。通过三交点法对绝对线轮廓的坐标值之间的高度差进行了评估。三个平面的高度差在 4.5nm 以内。使用近红外干涉仪的三交点法可用于测量硅平面反射镜的绝对平整度。