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动态电子背散射衍射花样。第一部分:花样模拟。

Dynamical electron backscatter diffraction patterns. Part I: pattern simulations.

机构信息

Department of Materials Science and Engineering, Carnegie Mellon University, Pittsburgh, PA 15213, USA.

出版信息

Microsc Microanal. 2013 Oct;19(5):1255-65. doi: 10.1017/S1431927613001840. Epub 2013 Jun 26.

DOI:10.1017/S1431927613001840
PMID:23800378
Abstract

A new approach for the simulation of dynamic electron backscatter diffraction (EBSD) patterns is introduced. The computational approach merges deterministic dynamic electron-scattering computations based on Bloch waves with a stochastic Monte Carlo (MC) simulation of the energy, depth, and directional distributions of the backscattered electrons (BSEs). An efficient numerical scheme is introduced, based on a modified Lambert projection, for the computation of the scintillator electron count as a function of the position and orientation of the EBSD detector; the approach allows for the rapid computation of an individual EBSD pattern by bi-linear interpolation of a master EBSD pattern. The master pattern stores the BSE yield as a function of the electron exit direction and exit energy and is used along with weight factors extracted from the MC simulation to obtain energy-weighted simulated EBSD patterns. Example simulations for nickel yield realistic patterns and energy-dependent trends in pattern blurring versus filter window energies are in agreement with experimental energy-filtered EBSD observations reported in the literature.

摘要

引入了一种新的动态背散射电子衍射(EBSD)花样模拟方法。该计算方法将基于布洛赫波的确定性动态电子散射计算与背散射电子(BSE)能量、深度和方向分布的随机蒙特卡罗(MC)模拟相结合。引入了一种基于改进的 Lambert 投影的有效数值方案,用于计算闪烁体电子计数作为 EBSD 探测器位置和取向的函数;该方法允许通过对主 EBSD 花样进行双线性内插来快速计算单个 EBSD 花样。主花样将 BSE 产率存储为电子出射方向和出射能量的函数,并与从 MC 模拟中提取的权重因子一起使用,以获得能量加权的模拟 EBSD 花样。针对镍的产量进行的示例模拟产生了逼真的花样,并且与文献中报道的实验能量过滤 EBSD 观察结果一致,表明花样模糊与滤波窗口能量之间存在能量相关的趋势。

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