Department of Materials Science and Engineering, Pohang University of Science and Technology (POSTECH), Pohang, 790-784, South Korea.
Microsc Microanal. 2013 Aug;19 Suppl 5:99-104. doi: 10.1017/S1431927613012427.
In this paper, we have observed an atomic-scale structure and compositional variation at the interface of the InGaN/GaN multi-quantum wells (MQW) by both scanning transmission electron microscopy (STEM) using high-angle annular dark-field mode and atom probe tomography (APT). The iso-concentration analysis of APT results revealed that the roughness of InGaN/GaN interface increased as the MQW layers were filled up, and that the upper interface of MQW (GaN/InGaN to the p-GaN side) was much rougher than that of the lower interface (InGaN/GaN tot he n-GaN side). On the basis of experimental results, it is suggested that the formation of interface roughness can affect the quantum efficiency of InGaN-based light-emitting diodes.
在本论文中,我们通过高角度环形暗场扫描透射电子显微镜(STEM)和原子探针层析技术(APT)观察到了 InGaN/GaN 多量子阱(MQW)界面的原子尺度结构和组成变化。APT 结果的等浓度分析表明,随着 MQW 层的填充,InGaN/GaN 界面的粗糙度增加,并且 MQW 的上界面(p-GaN 侧的 GaN/InGaN)比下界面(n-GaN 侧的 InGaN/GaN)粗糙得多。基于实验结果,我们认为界面粗糙度的形成会影响基于 InGaN 的发光二极管的量子效率。