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锂在掺杂和有缺陷的石墨烯中的扩散。

Li diffusion through doped and defected graphene.

机构信息

Materials Research Centre, Indian Institute of Science, Bangalore 560012, India.

出版信息

Phys Chem Chem Phys. 2013 Sep 28;15(36):15128-34. doi: 10.1039/c3cp52891j.

Abstract

We investigate the effect of nitrogen and boron doping on Li diffusion through defected graphene using first principles based density functional theory. While a high energy barrier rules out the possibility of Li- diffusion through the pristine graphene, the barrier reduces with the incorporation of defects. Among the most common defects in pristine graphene, Li diffusion through the divacancy encounters the lowest energy barrier of 1.34 eV. The effect of nitrogen and boron doping on the Li diffusion through doped defected-graphene sheets has been studied. N-doping in graphene with a monovacancy reduces the energy barrier significantly. The barrier reduces with the increasing number of N atoms. On the other hand, for N doped graphene with a divacancy, Li binds in the plane of the sheet, with an enhanced binding energy. The B doping in graphene with a monovacancy leads to the enhancement of the barrier. However, in the case of B-doped graphene with a divacancy, the barrier reduces to 1.54 eV, which could lead to good kinetics. The barriers do not change significantly with B concentration. Therefore, divacancy, B and N doped defected graphene has emerged as a better alternative to pristine graphene as an anode material for Li ion battery.

摘要

我们利用基于第一性原理的密度泛函理论研究了氮和硼掺杂对缺陷石墨烯中锂离子扩散的影响。虽然原始石墨烯中锂离子扩散的高能量势垒排除了其扩散的可能性,但该势垒随着缺陷的引入而降低。在原始石墨烯中最常见的缺陷中,穿过双空位的锂离子扩散具有最低的 1.34eV 能量势垒。我们研究了氮和硼掺杂对掺杂缺陷石墨烯片层中锂离子扩散的影响。在单空位的石墨烯中 N 掺杂会显著降低能量势垒。随着 N 原子数量的增加,势垒进一步降低。另一方面,对于具有双空位的 N 掺杂石墨烯,锂离子结合在片层平面上,具有增强的结合能。在单空位的石墨烯中 B 掺杂会导致势垒的增强。然而,在具有双空位的 B 掺杂石墨烯中,势垒降低至 1.54eV,这可能导致良好的动力学。随着 B 浓度的增加,势垒变化不大。因此,与原始石墨烯相比,双空位、B 和 N 掺杂缺陷石墨烯作为锂离子电池的阳极材料具有更好的应用前景。

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