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缺陷石墨烯片中硼氮掺杂的规则:带隙调控与氧还原反应催化能力的第一性原理研究

Rules of boron-nitrogen doping in defect graphene sheets: a first-principles investigation of band-gap tuning and oxygen reduction reaction catalysis capabilities.

作者信息

Sen Dipayan, Thapa Ranjit, Chattopadhyay Kalyan Kumar

机构信息

Thin Film and NanoScience Laboratory, Department of Physics, Jadavpur University, Kolkata 700032 (India).

出版信息

Chemphyschem. 2014 Aug 25;15(12):2542-9. doi: 10.1002/cphc.201402147. Epub 2014 Jun 6.

Abstract

Introduction of defects and nitrogen doping are two of the most pursued methods to tailor the properties of graphene for better suitability to applications such as catalysis and energy conversion. Doping nitrogen atoms at defect sites of graphene and codoping them along with boron atoms can further increase the efficiency of such systems due to better stability of nitrogen at defect sites and stabilization provided by B-N bonding. Systematic exploration of the possible doping/codoping configurations reflecting defect regions of graphene presents a prevalent doping site for nitrogen-rich BN clusters and they are also highly suitable for modulating (0.2-0.9 eV) the band gap of defect graphene. Such codoped systems perform significantly better than the platinum surface, undoped defect graphene, and the single nitrogen or boron atom doped defect graphene system for dioxygen adsorption. Significant stretching of the O-O bond indicates a lowering of the bond breakage barrier, which is advantageous for applications in the oxygen reduction reaction.

摘要

引入缺陷和氮掺杂是调整石墨烯性能以更好地适用于催化和能量转换等应用的两种最常用方法。在石墨烯的缺陷位点掺杂氮原子并与硼原子共掺杂,可以进一步提高此类体系的效率,这是因为氮在缺陷位点具有更好的稳定性以及B-N键提供的稳定性。系统探索反映石墨烯缺陷区域的可能掺杂/共掺杂构型,发现富含氮的BN团簇存在一个普遍的掺杂位点,它们也非常适合调节(0.2-0.9电子伏特)缺陷石墨烯的带隙。对于双氧吸附,这种共掺杂体系的性能明显优于铂表面、未掺杂的缺陷石墨烯以及单氮或单硼原子掺杂的缺陷石墨烯体系。O-O键的显著拉伸表明键断裂势垒降低,这有利于氧还原反应中的应用。

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